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Semiconductor Information
1001-5507
2002 Issue 9
Technology of millimeter-wave devices and circuits
sun zai-ji (the55th electronic research institute; nanjing210006; china)
..............page:9-13
Modeling of retention of single electron memory on the base of dis in tegration theory
guo rong-hui 1 ; zhao zheng-ping 2 ; liu yu-gui 3 ; zhou rui 3 ; lu shu-hai 3 ; qi rong-qiao 3 ; zhang yue-mei 3 ; lu miao 3(1.xi dian university; xi an710071; china; 2.china electronic science group; beijing100000
..............page:6-8,18
Progress in preparation of nanometer-sized soft ferrite
li dong-feng 1 ; yu wen-guang 3 ; jia zhen-bin 2 ; wei yu 2(1.department of chemistry; xingtai college; xingtai054001; china; 2.college of chemistry; hebei normal university; shiji azhuang050016; china; 3.department of chemistry; hulunbeier c
..............page:19-21,27
Nanometer-grade IC and ultrapure water
lin yao-ze (wuxi microelectronics research institute; wuxi214035; china)
..............page:1-5
Study of carbon nanotube application
pan hui 1 ; cao quan-xi 1 ; tong li-ying 2 ; zhou xiao-hua 1(1.xi dian university; xi an710071; china; 2.the46th electronic research institute; tianjin300220; china)
..............page:14-18
ri ben na mi yan jiu kuai xun ji jin
..............page:44-46
New isolation technology of IC:STI isolation
wen li 1 ; wang jian-hua 2(1.beijing shougang high-tech co .ltd.; beijing100085; china; 2.hefei university of technology; hefei230009; china)
..............page:39-43
Application of biosensor to the water-pollution monitoring
he xing-yue 1 ; liu zhi-jing 2(1.dept .for biology; ustc; hefei230027; china; 2.dept .for astr.and appl .phys.; ustc; hefei230026; china)
..............page:28-31
Establishment about mechanical structure of model DY-2001 microarrayer
zhang chun-ye; wang li-ming; lin yun-sheng (institute of electrical engineering acadmia sinica; beijing100080; china)
..............page:36-38
Study of scanning stage on biochip scanner
chen xing-jun; hu song; yao han-min; liu ye-yi (institute of optics and electronics; chinese academy of sciences; chengdu610209; china)
..............page:32-35
Releasing the suspending structure in surface micromachining with the method of sublimation
hao yi-long; wu guo-ying; wu lin; xu jia-jia (dep.of microelectronics; beijing university; beijing100871; china)
..............page:22-27