Influences of annealing temperature on the structure and luminescence of nanometer ZnO films
chen xiao-qing; xie zi-li; zhang rong; xiu xiang-qian; gu shu-lin; han ping; shi yi; zheng you-dou(jiangsu provincial key laboratory of photonic and electronic materials science and technology; department of physics; nanjing university; nanjing 210093; china)

..............page:24-27

Research on silicon differential capacitive pressure sensor
zhang zhi-guo1; chu bin2; li ying1; sun hai-wei1; zhu yong-feng1; lin hong1; liu qin1; kuang shi1; chen xin-qi1(1.shenyang academy of instrumentation science; shenyang 110043; china; 2.jilin chemical industrial group corporation instruments factory; jilin 132022; china)

..............page:39-42

Progress on the preparation and characterization methods of nanosized metal oxides
liu hui1; zhu mei-ying2; wei yu1(1.college of chemistry; hebei normal university; shijiazhuang 050016; china; 2.basic medical college; hebei medical university; shijiazhuang 050017; china)

..............page:17-23,38

Computer simulation for photomask pattern processing
su peng-yi1; 2; chen kai-sheng1; cao zhuang-qi2(1.shanghai optical lithography electronic engineering co.; shanghai 200233; china; 2.shanghai jiao tong university; shanghai 200030; china)

..............page:43-45

Low temperature bonding technology in fabrication of microfluidic chips
xin long-tao1; 2; chen hua1; xia zhi-ning1(1.institute of chemistry and chemical engineering; chongqing university; chongqing 400044; china; 2.taiji group co.; ltd.; chongqing 400015; china)

..............page:7-11

Simulation of RTD multiple valued logic circuit
liu hong-wei1; niu ping-juan1; guo wei-lian1; 2(1.school of information and communication eng. tianjin polytechnic university; tianjin 300160; china; 2.school of electronic information eng. tianjin university; tianjin 300072; china)

..............page:12-16

Scientific problems of electro-material & -device of SiC and GaN
li xiao-bai(national key laboratory of asic; the 13th reserch institute; cetc; shijiazhuang 050051; china)

..............page:1-6

Pull-in phenomena analysis of MOEM Selectrostatic rotation structure
yue ning-yu; wan jiang-wen(beijing university of posts and telecommunications; beijing 100876; china)

..............page:28-31,38

MEMS micro-processing technologies
kong xiang-dong1; 2; zhang yu-lin1; song hui-ying1; lu wen-juan1(1.institute of electron beam; shandong university; jinan 250061; china; 2.dongying polytechnic institute; dongying 257091; china)

..............page:32-38

Introduction of immersion photolithography
wu long-hai(photolithography dept. of gsmc; shanghai 201203; china)

..............page:46-48

luo men ha si dian zi cai liao gong si tui chu yong yu 90nm di k xi lie zu dang ceng yan mo ye

..............page:48