The Low-k Insulating Layer and Its Equipment
weng shou-song(wuxi luo te electronic co.; ltd. wuxi 214002; china)

..............page:90-94

Rapid Simulation of Electrostatically Piston Actuated Segment Micromirror
rao fu-bo; qiao da-yong; yuan wei-zheng; jiang cheng-yu(mems/nems lab; northwestern polytechnical university; xi an 710072; china)

..............page:78-82

Studies of the Corrosion Resistance of BP-212 Positive Resist
zheng zhi-xia1a; 2; feng yong-jian1b; zhang dan1a; lin yan-fei1a(1.xiamen university a.department of mechanical & electronic engineer; b.pen tung sah mems research center; xiamen 361005; china; 2.department of mechanical & electronic engineer; putian university; putian 351100; china)

..............page:87-89,94

Quantized Conductance in Mesoscopic System
ren min; chen pei-yi(institute of microelectronics; tsinghua university; beijing 100084; china)

..............page:49-54,82

Design for a Late Model Chip of Microfluidic Measuring
li yi; zheng xiao-lin; zhang wen-xian(key laboratory of biomechanics & tissue engineering; chongqing university; ministry of education; chongqing 400044; china)

..............page:62-65

Preparation and Characterization of SnS Thin Films
zheng chun-rui a; lei tian-mina; hu yong-hong a; li hong-sheng a; liu shou-zhi b(xi an university of technology a.department of electronic engineering; b.department of material engineering; xi an 710048; china)

..............page:66-68

Research Development of Carbon Nanotube FET
li he-wei; wang qiang(the 13th research institute; cetc; shijiazhuang 050051; china)

..............page:55-61,65

Sacrificial Layer Technology in MEMS
zhang yong-hua; ding gui-fu; li yong-hai; cai bing-chu(research institute of micro/nanometer science & technology; shanghai jiao tong university; shanghai 200030; china)

..............page:73-77

ye jie kuai xun

..............page:95-96

Electrochemistry Studies on Fe~(3+)Doped TiO_2 Films Electrode
huo li; ding ke-qiang; wang qing-fei; tong ru-ting(department of chemistry; hebei normal university; shijiazhuang 050016; china)

..............page:69-72,77

Research on the Elimination of the Cross-Coupling Error in a Monolithic Micro Motion Stage
chinesisch-deutsches institut; tongji university; shanghai 200092; china)ma kui; dai hui; dong wei-jun

..............page:83-86