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1001-5507
2008 Issue 12
Etching Technology of Si-Based Two-Dimension Deep Microchannel Array
xiang rong1; 2; wang guozheng1; chen li1; gao yanjun1; wang xin1; li ye1; duanmu qingduo1; tian jingquan1(1.changchun university of science; changchun 130022; china; 2.the ordnance science institute of china; beijing 100089; china)
..............page:729-733
InSb-In Magnetoresistive in Temperature Control Equipments
liu bing; huang zhaohong; kong lingtao(laboratory of photonic information technology; school of information and photoelectric science and engineering; scnu; guangzhou 510006; china)
..............page:734-737
shi chang
wang ling ; wang shu hua
..............page:740-742
Electron Beam Lithography Application on the Nanofabrication and Nanodevice
chen baoqin; zhao min; wu xuan; niu jiebin; liu jian; ren liming; wang qin; zhu xiaoli; xu qiuxia; xie changqing; liu ming(the institute of microelectronics; chinese academy of sciences; beijing 100029; china)
..............page:683-688
Stress Analysis of GaN Materials Grown on Si(111) Substrates
yin jiayun1; liu bo1; zhang sen1; 2; feng zhihong1; feng zhen1; cai shujun1(1.national key lab of asic; shijiazhuang 050051; china; 2.school of materials science and engineering; harbin institute of technology; harbin 150001; china)
..............page:703-705,711
Electrical Characteristic of GaN-Based Field-Effect Transistor with Ferroelectric Gate
cai xueyuan; ran jinzhi; wei ying; yang jianhong(institute of microelectronics; school of physical s&t; lanzhou university; lanzhou 730000; china)
..............page:694-697
Mid-Wavelength and Long-Wavelength Two-Color Quantum Well Infrared Photodetectors
zhao yonglin; li xianjie; liu yingbin; qi lifang; guo fan; cai daomin; yin shunzheng; liu tiao(the 13th institute; cetc; shijiazhuang 050051; china)
..............page:689-693
Fabrication and Properties of(Ni,Li) Doped ZnO Thin Films
song haian; ye xiaojuan; zhong wei; du youwei(nanjing national laboratory of microstructures; nanjing university; nanjing 210093; china)
..............page:698-702
Ka-Band Wideband Vertical Transition Using Silicon Micromachined Processing
dai xinfeng a; yu yuanwei a; jia shixing b; zhu jian a; yu xiaofeng c; ding yuning c(a.national key laboratory of monolithic integrated circuits and modules; b.mico/nano research & development; c.branch of millimeterwave circuits; nanjing electronic devices institute; nanjing 210016; china)
..............page:712-715
Micro/Nano-Lithography Technology Based on Surface Plasmons
yang yong1; 2; hu song1; yao hanmin1; yan wei1; zhao lixin1; zhou shaolin1; 2; chen wangfu1; 2; jiang wenbo1; 2; li zhan1(1.institute of optics and electronics; chinese academy of sciences; chengdu 610209; china; 2.graduate school; chinese academy of sciences; beijing 100039; china)
..............page:716-719,728
Su-8-Metal Composite Electro-Thermal Micro Actuators
chen jing; ding guifu; yang zhuoqing(micro/nano sci&tec research institute; shanghai jiaotong university; shanghai 200240; china)
..............page:706-711
Pore Size Measurement for Anode Aluminum Oxidized Membranes
lu junfeng(technical institute of physics & chemistry; cas; beijing 100190; china)
..............page:720-723
Fabrication of Nano-Silicon-Tips Based on Anisotropic Wet Etching Technique
shi erlei a; cui yan a; b; xia jinsong a; wang liding a(a.key laboratory for micro/nano technology and system of liaoning province; b.key laboratory for precision and non-traditional machining technology of ministry of education; dalian university of technology; dalian 116023; china)
..............page:724-728
chan pin
..............page:739-740
ji shu
..............page:738-739