..............page:315-320
Development of La-Based High-k Gate Dielectric
chen wei1; 2; fang zebo2; ma xiying2; chen jiajun1; song jingwei1; 2(1.college of physics and electronic information; china west normal university; nanchong 637002; china; 2.department of physics & information engineering; shaoxing college of arts and science; shaoxing 312000; china)
..............page:282-289
..............page:273-276
..............page:277-281
Research on Nitride Membranes Grown by PECVD
tao tao; su hui; xie zili; zhang rong; liu bin; xiu xiangqian; li yi; han ping; shi yi; zheng youdou(jiangsu provincial key laboratory of photonic and electronic materials science and technology; department of physics; nanjing university; nanjing 210093; china)
..............page:267-272,303
..............page:290-296
..............page:297-303
..............page:304-307,320
Research Progress in Preparation Methods of Nanometer La_2O_3 and Its Composite Oxides
tan linghua1a; 2; li qinhua1b; guo changping1b; feng chunxia2; pan renming1b; li fengsheng1a(1.a.national special superfine powder engineering research center; b.school of chemical engineering; nanjing university of science and technology; nanjing 210094; china; 2.department of material engineering; nanjing institute of technology; nanjing 211167; china)
..............page:257-266,289
..............page:308-314