Quality Control of Semiconductor Device Process by SPC Technique
Wang Wenjun

..............page:518-521

ICP Etching for GaAs p-i-n Process
Zhang Lijiang;Yao Jinqiang;Cui Yuxing;Fu Xingchang

..............page:503-506

Research on Wet Etching of Bismuth Based Cubic Pyrochlore Films
Gao Libin;Li Ruguan;Jiang Shuwen;Li Yanrong

..............page:499-502

guo ji shi dian
wang ling ; wang shu hua ;

..............page:522-524

Research on Distribution of Power FETs with Large Gate Width
Fang Jiaxing;Hu Zhifu;Cai Shujun

..............page:513-517

Highly Accelerated Stress Test of High Density Packaging ICs
Zhang Shanlun1;2;Lai Ping2;Yao Bin2;Liu Jian2;Li Bin1

..............page:507-512

Status and Development Trend of Organic Semiconductor Devices
Chen Haiming1;Jin Baoshan2

..............page:470-474

System-Level Modeling Method of Variable Cross-Section Beams
Hao Xing;Yuan Weizheng;Chang Honglong;Niu Haobin;Jiao Wenlong

..............page:484-489,502

Progress of Ni-Mn-Ga Ferromagnetic Shape Memory Films
Chen Fenghua;Zhang Mingang;Chai Yuesheng;Zhang Zhenzhen

..............page:480-483

Logic Circuits Composed by CMOS NDR Elements and Their Development Prospect
Guo Weilian1;2;Niu Pingjuan1;Li Xiaoyun1;Liu Hongwei1;Gu Xiao1;Mao Luhong2;Zhang Shilin2;Chen Yan2;Wang Wei3

..............page:461-469,506

Polymethylacrylic Acid Grafted on the Surface of Carbon Microbeads by Photoinitiation
Liu Weifenga;b;Han Yanxinga;b;Guo Mingconga;b;Yang Yongzhena;c;Liu Xuguanga;b;Xu Bingshea;c

..............page:475-479

Focusing and Leveling in Dual-Stage Lithographic Systems
Li Jinlong1;2;Zhao Lixin1;Hu Song1;Zhou Shaolin1;2

..............page:494-498

Estimate Method of MEMS Gyroscope Performance Based on Allan Variance
Zou Xuefeng;Lu Xinyan

..............page:490-493,498