Analysis of Diffraction Characteristics for the Apodized Volume Grating in the High Power Laser Beam
Wang Junzhen;Wang Yuefeng;Bai Huijun;Electrics & Optics Engineering Department;Ordnance Engineering College;

..............page:677-682

Physical Model and Research Progress of the SNSPD
Yin Heyu;Cheng Risheng;Xu Zheng;Cai Han;Jiang Zhennan;Li Tiefu;Liu Jianshe;Chen Wei;Institute of Microelectronics;Tsinghua University;Tsinghua National Laboratory for Information Science and Technology;Tsinghua University;Department of Micro-Nano Electronics;Tsinghua University;

..............page:683-694

1 000 V 4H-SiC JBS Power Diode Cells
Wu Hao;Yang Fei;Yu Kunshan;Department of New Electrical Materials & Microelectronics;State Grid Smart Grid Research Institute;

..............page:695-700

Embedded Ta₂O₅ Isolation for Ferroelectric BaTiO₃ Films
Zhang Anbang;Qi Xiaosi;Deng Chaoyong;School of Electronic Information;Guizhou University;Key Laboratory of Functional Composite Materials of Guizhou Province;Guizhou University;

..............page:701-704+709

Preparation and Luminescence Properties of SnO₂ Nanostructures
Wang Yu;Li Yuguo;Fang Xiang;Liu Yongfeng;Physical and Electronic Scientific Institute;Shandong Normal University;

..............page:705-709

Research Progress of the Passive Microfluidic Mixers
Chen Xueye;Li Tiechuan;Faculty of Mechanical Engineering and Automation;Liaoning University of Technology;

..............page:710-714+720

Research Status and Developing Trend of Micro Vibration-Based Energy Harvesters
Chen Wenyi;Meng Aihua;Liu Chenglong;Institute of Mechatronic Engineering;Hangzhou Dianzi University;

..............page:715-720

Fabrication of the Template for OLED Substrate Microstructures with UV Nanoimprinting Lithography
Li Yang;Xu Wei;Wang Yi;Chen Kui;Zhu Mingjia;Pan Yawen;Liang Jingsheng;School of Applied Physics and Materials;WuYi University;Institute of Research on Advanced Manufacturing Technology;Xi’an Jiaotong University;

..............page:721-725+734

Phosphoric Acid as a pH Adjustor Applied in the Barrier Chemical Mechanical Planarization
Gao Jiaojiao;Liu Yuling;Wang Chenwei;Cao Yang;Chen Rui;Cai Ting;Institute of Microelectronics;Hebei University of Technology;

..............page:726-730

Influences of the Boron Doping Concentration on the Diamond Film Electrode
Guo Qian;Tan Baimei;Gao Baohong;Zhen Jiali;Zhao Yunhe;Institute of Microelectronics;Hebei University of Technology;

..............page:731-734

Alkaline Slurry and the Process for TSV Cu CMP
Cai Ting;Liu Yuling;Wang Chenwei;Niu Xinhuan;Chen Rui;Gao Jiaojiao;Institute of Microelectronics;Hebei University of Technology;

..............page:735-738+742

Edge Treatment of the Substrate for the Thick-Layer Si Epitaxy
Zhang Weicai;Zhao Quan;Tao Shuhe;Chen Jianyue;The 46th Research Institute;CETC;

..............page:739-742

chan pin
wang ling ;

..............page:743-744